Elements of Plasma Technology by Chiow San Wong, Rattachat Mongkolnavin PDF

By Chiow San Wong, Rattachat Mongkolnavin

ISBN-10: 9811001154

ISBN-13: 9789811001154

This e-book provides a few basic facets of plasma know-how which are very important for novices to begin learn within the zone of plasma expertise . those comprise the homes of plasma, tools of plasma iteration and easy plasma diagnostic innovations. It additionally discusses a number of within your means plasma units, together with pulsed plasma assets equivalent to plasma concentration, pulsed capillary discharge, vacuum spark and exploding twine; in addition to low temperature plasmas reminiscent of glow discharge and dielectric barrier discharge which the authors think can have capability purposes in undefined. The remedies are experimental instead of theoretical, even though a few theoretical heritage is equipped the place acceptable. the rules of operation of those units also are reviewed and discussed.

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However, the plasma impedance is time varying so it is difficult to maintain the matching condition for critically damped discharge. For a high temperature plasma, the plasma resistance is normally low so the plasma can be represented by an inductance only. In this case the discharge is expected to be under-damped. On the other hand, in a high pressure pulsed discharge, the plasma resistance is sufficiently high that it may be possible to achieve the condition for critically damped discharge. One such example is the high pressure flash lamp.

The first is that the high discharge current causes a constriction effect on the plasma column. Secondly, the electrodes are severely heated and they should be cooled by running water. The heating effect will eject some of the electrode materials into the plasma and thus cools the plasma close to the electrode surfaces. As a consequence of this cooling effect this part of the plasma column is constricted to smaller radius than the rest of the column. An important property of the thermal arc discharge operating at high pressure is its ability to achieve thermodynamic equilibrium.

However, the plasma impedance is time varying so it is difficult to maintain the matching condition for critically damped discharge. For a high temperature plasma, the plasma resistance is normally low so the plasma can be represented by an inductance only. In this case the discharge is expected to be under-damped. On the other hand, in a high pressure pulsed discharge, the plasma resistance is sufficiently high that it may be possible to achieve the condition for critically damped discharge. One such example is the high pressure flash lamp.

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Elements of Plasma Technology by Chiow San Wong, Rattachat Mongkolnavin


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